CN radical production and excitation in a thermal Ar/N2 plasma expanding through a graphite nozzle

A. Graaf, de, P.D.J. van Deurzen, M.C.M. Sanden, van de, D.C. Schram, E. Aldea, G. Dinescu

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Abstract

The use of an Expanding Thermal Plasma (ETP) generated by a cascaded arc for deposition of hydrogen-free carbon nitride material was investigated. For this purpose expts. with an Ar/N2 plasma expanding through a graphite nozzle were performed. The deposition environment was investigated by-emission spectroscopy. The exptl. results give insight in the processes related to the interaction of a nitrogen plasma with a carbon surface and the excitation of the resulting carbon-contg. plasma species. Evidence is found that in an Ar/N2 ETP with a graphite nozzle CN is formed by-the chem. etching of the carbon surface by nitrogen atoms. The excitation of CN(X) species in the expansion is most probably realized by vibrationally excited N2(X,v) states which are formed by reassocn. of nitrogen atoms at the walls. [on SciFinder (R)]
Original languageEnglish
Title of host publicationProceedings of the 24th International Conference on Phenomena in Ionised Gases (XXIV ICPIG 1999), 11 - 16 July 1999, Warsaw, Poland
EditorsP. Pisarczyk, J. Pisarczyk, J. Wolowski
Place of PublicationWarsaw
PublisherInstitue of Plasma Physics and Laser Microfusion
PagesP-424-15/16
ISBN (Print)83-90231-95-6
Publication statusPublished - 1999
Event24th International Conference on Phenomena in Ionized Gases (ICPIG 1999), July 11-16, 1999, Warsaw, Poland - Warsaw, Poland
Duration: 11 Jul 199916 Jul 1999

Conference

Conference24th International Conference on Phenomena in Ionized Gases (ICPIG 1999), July 11-16, 1999, Warsaw, Poland
Abbreviated titleICPIG 1999
Country/TerritoryPoland
CityWarsaw
Period11/07/9916/07/99

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