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Cleaning procedure for single-crystal tungsten substrates

  • H.M.R. Cortenraad
  • , S.N. Ermolov
  • , A.W. Denier van der Gon
  • , V.G. Glebovsky
  • , H.H. Brongersma
  • , A. Manenschijn
  • , G. Gärtner
  • , E.V. Belozerov

Research output: Contribution to journalArticleAcademicpeer-review

Abstract

Single-crystal tungsten substrates produced by electron-beam melting were cleaned by annealing in an oxygen atmosphere (10–3Pa, 1500°C) for a few hours to remove adsorbed carbon and by high-temperature ultrahigh-vacuum annealing (2 × 10–8Pa, 2500°C) for a few minutes to remove residual oxygen. The process was followed by low-energy ion scattering, Auger electron spectroscopy, and low-energy electron diffraction. The carbon and oxygen adsorbed on the surface of single-crystal tungsten were found to form ordered, oriented structures. The resultant high-purity, structurally perfect W substrates were used to study electron emission in the Ba/W and Re/W systems.
Original languageEnglish
Pages (from-to)673-677
JournalInorganic Materials
Volume37
Issue number7
DOIs
Publication statusPublished - 2001

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