Cl2-based inductively coupled plasma etching of photonic crystals in InP

R. Heijden, van der; M.S.P. Andriesse; C.F. Carlstrom; E.W.J.M. Drift, van der; E.J. Geluk; R.W. Heijden, van der; F. Karouta; P.A.M. Nouwens; Y.S. Oei; T. Vries, de; H.W.M. Salemink

Cl2-based inductively coupled plasma etching of photonic crystals in InP

R. Heijden, van der
, M.S.P. Andriesse
, C.F. Carlstrom
, E.W.J.M. Drift, van der
, E.J. Geluk
, R.W. Heijden, van der
, F. Karouta
, P.A.M. Nouwens
, Y.S. Oei
, T. Vries, de
, H.W.M. Salemink

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional photonic crystals in the InP-based material system. The influence of temperature, ion current density and ion energy on etch rate and hole profile was studied. Nitrogen was added to the Cl2-chemistry for sidewall passivation to obtain vertical hole profile.

Original language	English
Title of host publication	Proceedings of the 9th annual symposium of the IEEE/LEOS Benelux Chapter 2-3 December 2004, Ghent, Belgium
Pages	287-290
Publication status	Published - 2004
Event	9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium - Ghent, Belgium Duration: 2 Dec 2004 → 3 Dec 2004

Conference

Conference	9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium
Country/Territory	Belgium
City	Ghent
Period	2/12/04 → 3/12/04

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Heijden, van der, R., Andriesse, M. S. P., Carlstrom, C. F., Drift, van der, E. W. J. M., Geluk, E. J., Heijden, van der, R. W., Karouta, F., Nouwens, P. A. M., Oei, Y. S., Vries, de, T., & Salemink, H. W. M. (2004). Cl2-based inductively coupled plasma etching of photonic crystals in InP. In Proceedings of the 9th annual symposium of the IEEE/LEOS Benelux Chapter 2-3 December 2004, Ghent, Belgium (pp. 287-290)

@inproceedings{b92b3baff5454d6ea1a379c8e95dfb77,

title = "Cl2-based inductively coupled plasma etching of photonic crystals in InP",

abstract = "We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional photonic crystals in the InP-based material system. The influence of temperature, ion current density and ion energy on etch rate and hole profile was studied. Nitrogen was added to the Cl2-chemistry for sidewall passivation to obtain vertical hole profile.",

author = "\{Heijden, van der\}, R. and M.S.P. Andriesse and C.F. Carlstrom and \{Drift, van der\}, E.W.J.M. and E.J. Geluk and \{Heijden, van der\}, R.W. and F. Karouta and P.A.M. Nouwens and Y.S. Oei and \{Vries, de\}, T. and H.W.M. Salemink",

year = "2004",

language = "English",

isbn = "90-76546-06-1",

pages = "287--290",

booktitle = "Proceedings of the 9th annual symposium of the IEEE/LEOS Benelux Chapter 2-3 December 2004, Ghent, Belgium",

note = "9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium ; Conference date: 02-12-2004 Through 03-12-2004",

}

Heijden, van der, R, Andriesse, MSP, Carlstrom, CF, Drift, van der, EWJM, Geluk, EJ, Heijden, van der, RW, Karouta, F, Nouwens, PAM, Oei, YS, Vries, de, T & Salemink, HWM 2004, Cl2-based inductively coupled plasma etching of photonic crystals in InP. in Proceedings of the 9th annual symposium of the IEEE/LEOS Benelux Chapter 2-3 December 2004, Ghent, Belgium. pp. 287-290, 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium, Ghent, Belgium, 2/12/04.

Cl2-based inductively coupled plasma etching of photonic crystals in InP. / Heijden, van der, R.; Andriesse, M.S.P.; Carlstrom, C.F. et al.
Proceedings of the 9th annual symposium of the IEEE/LEOS Benelux Chapter 2-3 December 2004, Ghent, Belgium. 2004. p. 287-290.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Cl2-based inductively coupled plasma etching of photonic crystals in InP

AU - Heijden, van der, R.

AU - Andriesse, M.S.P.

AU - Carlstrom, C.F.

AU - Drift, van der, E.W.J.M.

AU - Geluk, E.J.

AU - Heijden, van der, R.W.

AU - Karouta, F.

AU - Nouwens, P.A.M.

AU - Oei, Y.S.

AU - Vries, de, T.

AU - Salemink, H.W.M.

PY - 2004

Y1 - 2004

N2 - We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional photonic crystals in the InP-based material system. The influence of temperature, ion current density and ion energy on etch rate and hole profile was studied. Nitrogen was added to the Cl2-chemistry for sidewall passivation to obtain vertical hole profile.

AB - We have investigated Cl2-based inductively coupled plasma etching for fabrication of two-dimensional photonic crystals in the InP-based material system. The influence of temperature, ion current density and ion energy on etch rate and hole profile was studied. Nitrogen was added to the Cl2-chemistry for sidewall passivation to obtain vertical hole profile.

M3 - Conference contribution

SN - 90-76546-06-1

SP - 287

EP - 290

BT - Proceedings of the 9th annual symposium of the IEEE/LEOS Benelux Chapter 2-3 December 2004, Ghent, Belgium

T2 - 9th Annual Symposium of the IEEE/LEOS Benelux Chapter, December 2-3, 2004, Ghent, Belgium

Y2 - 2 December 2004 through 3 December 2004

ER -

Cl2-based inductively coupled plasma etching of photonic crystals in InP

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