Chemical vapor deposition of (in)organic layers : in situ film growth studies, nano-porosity and moisture permeation barrier properties

Chemistry

• Porosity 100%
• Liquid Film 100%
• Permeation 100%
• Polymer 83%
• Monomer 50%
• Ellipsometry 41%
• Device 33%
• Microstructure 33%
• Polymerization 33%
• Plasma-Enhanced Chemical Vapor Deposition 33%
• Procedure 25%
• Thickness 25%
• Deposition Process 25%
• Surface 16%
• Water Type 16%
• Concentration 16%
• Chemistry 16%
• Roll 16%
• Correlation 16%
• Optical Constant 16%
• Encapsulation 16%
• Effective Porosity 16%
• Time 8%
• Application 8%
• Engineering Process 8%
• Aqueous Solution 8%
• Density 8%
• Liquid 8%
• Dioxygen 8%
• Anisotropy 8%
• Vacuum 8%
• Sorption 8%
• Refractive Index 8%
• Foil 8%
• Deposition Technique 8%
• Siloxane 8%
• Vacuum Chamber 8%
• Optical Anisotropy 8%
• Water Vapor 8%

Material Science

• Void Fraction 100%
• Multilayers 100%
• Film Growth 100%
• Chemical Vapor Deposition 100%
• Defect 83%
• Polymer 83%
• Decoupling 50%
• Devices 41%
• Adsorption 25%
• Infiltration 25%
• Surface 16%
• Characterization 16%
• Silicon 16%
• Nanopore 16%
• Polymeric Substrate 16%
• Ellipsometric Porosimetry 16%
• Microstructure Characterization 16%
• Microstructure 16%
• Solution 8%
• Liquid 8%
• Al2O3 8%
• Silicon Nitride 8%
• Thin Films 8%
• Optical Anisotropy 8%
• Water Vapor 8%
• Polymerization 8%
• Metal Foil 8%
• Desorption 8%
• Density 8%
• Refractive Index 8%
• Solar Cell 8%
• Anisotropy 8%
• Vacuum Deposition 8%