Chemical role of SF6 in a SiCl4-based reactive ion etching of GaN

F. Karouta, B. Jacobs, M.C.J.C.M. Krämer, K. Jacobs, I. Moerman

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Original languageEnglish
Title of host publicationConference on Semiconductor and Integrated OptoElectronics (SIOE'99), Paper # 23
Publication statusPublished - 1999
Event1999 Conference on Semiconductor and Integrated OptoElectronics (SIOE '99), April 7-9, 1999, Cardiff, UK - Cardiff, United Kingdom
Duration: 7 Apr 19999 Apr 1999

Conference

Conference1999 Conference on Semiconductor and Integrated OptoElectronics (SIOE '99), April 7-9, 1999, Cardiff, UK
Abbreviated titleSIOE '99
CountryUnited Kingdom
CityCardiff
Period7/04/999/04/99

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