Chemical and Complementary Role of Fluorine in a Chlorine Based Reactive Ion Etching of GaN

F. Karouta, B. Jacobs, O. Schön, M. Heuken

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

5 Citations (Scopus)
Original languageEnglish
Title of host publication3rd International Conference on Nitride Semiconductors
Pages105-
Publication statusPublished - 1999
Event3rd International Conference on Nitride Semiconductors, 1999 - Montpellier, France
Duration: 5 Jul 19999 Jul 1999

Conference

Conference3rd International Conference on Nitride Semiconductors, 1999
CountryFrance
CityMontpellier
Period5/07/999/07/99
Other3rd International Conference on Nitride Semiconductors, Montpellier, France, 5-9 July

Cite this

Karouta, F., Jacobs, B., Schön, O., & Heuken, M. (1999). Chemical and Complementary Role of Fluorine in a Chlorine Based Reactive Ion Etching of GaN. In 3rd International Conference on Nitride Semiconductors (pp. 105-)