Abstract
The charge carrier distribution in dual-gate field-effect transistors is investigated as a function of semiconductor thickness. A good agreement with 2-dimensional numerically calculated transfer curves is obtained. For semiconductor thicknesses larger than the accumulation width, two spatially separated channels are formed. The cross-over from accumulation into depletion of the two channels in combination with a carrier density dependent mobility causes a shoulder in the
transfer characteristics. A semiconducting monolayer has only a single channel. The charge carrier density, and consequently the mobility, are virtually constant and change monotonically with applied gate biases, leading to transfer curves without a shoulder.
| Original language | English |
|---|---|
| Article number | 023308 |
| Pages (from-to) | 1-4 |
| Number of pages | 4 |
| Journal | Applied Physics Letters |
| Volume | 100 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2012 |