Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments

F.M.J.H. Wetering, van de, S. Nijdam, G.M.W. Kroesen

Research output: Contribution to conferencePosterAcademic

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Abstract

In extreme ultraviolet (EUV) lithography, ionic and particulate debris coming from the plasma source plays an important role. We started up a project looking at the principles of particle formation in plasmas and the interaction with EUV radiation. To this end, we study a low-pressure (10 Pa) capacitively-coupled radio-frequency (13.56 MHz) argon-acetylene plasma. In low-pressure hydrocarbon plasmas, dust particles spontaneously form under certain conditions. The whole process occurs in a matter of seconds to minutes after igniting the plasma and results in a cloud of particulates up to micrometer sizes levitating in the plasma. Several techniques are used to gain information about the plasma dynamics. Microwave cavity resonance spectroscopy is used to determine the global electron density. Mie laser scattering is used to locally determine the dust particle density. Suspended dust particles will scatter the laser light, resulting in a visible trace through the cavity, which is also imaged from below with a video camera. The electrical characteristics of the plasma (current, voltage, impedance, dissipated power) are determined using a commercially available plasma impedance monitor. All of these techniques are time resolved and are complemented with scanning and transmission electron microscopy of the grown dust particles to infer their sizes. We conclude by presenting an overview of approaches for future research predominantly aimed at the interactions in a more EUV-like environment.
Original languageEnglish
Publication statusPublished - 2012
Event15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012) - Conference centre "Rolduc", Kerkrade, Netherlands
Duration: 22 Nov 201223 Nov 2012
https://www.tue.nl/fileadmin/content/faculteiten/tn/PMP/Guidelines__PMP__TuMo_/announcement.pdf

Workshop

Workshop15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012)
Abbreviated titleWELTPP-15
CountryNetherlands
CityKerkrade
Period22/11/1223/11/12
Internet address

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acetylene
argon
dust
particulates
low pressure
impedance
extreme ultraviolet radiation
plasma dynamics
cavities
plasma currents
debris
lasers
monitors
micrometers
radio frequencies
lithography
hydrocarbons
cameras
interactions
microwaves

Bibliographical note

Poster presented at the 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-15 2012), 22-23 November 2012, Kerkrade, The Netherlands

Cite this

Wetering, van de, F. M. J. H., Nijdam, S., & Kroesen, G. M. W. (2012). Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments. Poster session presented at 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012), Kerkrade, Netherlands.
Wetering, van de, F.M.J.H. ; Nijdam, S. ; Kroesen, G.M.W. / Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments. Poster session presented at 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012), Kerkrade, Netherlands.
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author = "{Wetering, van de}, F.M.J.H. and S. Nijdam and G.M.W. Kroesen",
note = "Poster presented at the 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-15 2012), 22-23 November 2012, Kerkrade, The Netherlands; 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012), WELTPP-15 ; Conference date: 22-11-2012 Through 23-11-2012",
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Wetering, van de, FMJH, Nijdam, S & Kroesen, GMW 2012, 'Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments' 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012), Kerkrade, Netherlands, 22/11/12 - 23/11/12, .

Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments. / Wetering, van de, F.M.J.H.; Nijdam, S.; Kroesen, G.M.W.

2012. Poster session presented at 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012), Kerkrade, Netherlands.

Research output: Contribution to conferencePosterAcademic

TY - CONF

T1 - Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments

AU - Wetering, van de, F.M.J.H.

AU - Nijdam, S.

AU - Kroesen, G.M.W.

N1 - Poster presented at the 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-15 2012), 22-23 November 2012, Kerkrade, The Netherlands

PY - 2012

Y1 - 2012

N2 - In extreme ultraviolet (EUV) lithography, ionic and particulate debris coming from the plasma source plays an important role. We started up a project looking at the principles of particle formation in plasmas and the interaction with EUV radiation. To this end, we study a low-pressure (10 Pa) capacitively-coupled radio-frequency (13.56 MHz) argon-acetylene plasma. In low-pressure hydrocarbon plasmas, dust particles spontaneously form under certain conditions. The whole process occurs in a matter of seconds to minutes after igniting the plasma and results in a cloud of particulates up to micrometer sizes levitating in the plasma. Several techniques are used to gain information about the plasma dynamics. Microwave cavity resonance spectroscopy is used to determine the global electron density. Mie laser scattering is used to locally determine the dust particle density. Suspended dust particles will scatter the laser light, resulting in a visible trace through the cavity, which is also imaged from below with a video camera. The electrical characteristics of the plasma (current, voltage, impedance, dissipated power) are determined using a commercially available plasma impedance monitor. All of these techniques are time resolved and are complemented with scanning and transmission electron microscopy of the grown dust particles to infer their sizes. We conclude by presenting an overview of approaches for future research predominantly aimed at the interactions in a more EUV-like environment.

AB - In extreme ultraviolet (EUV) lithography, ionic and particulate debris coming from the plasma source plays an important role. We started up a project looking at the principles of particle formation in plasmas and the interaction with EUV radiation. To this end, we study a low-pressure (10 Pa) capacitively-coupled radio-frequency (13.56 MHz) argon-acetylene plasma. In low-pressure hydrocarbon plasmas, dust particles spontaneously form under certain conditions. The whole process occurs in a matter of seconds to minutes after igniting the plasma and results in a cloud of particulates up to micrometer sizes levitating in the plasma. Several techniques are used to gain information about the plasma dynamics. Microwave cavity resonance spectroscopy is used to determine the global electron density. Mie laser scattering is used to locally determine the dust particle density. Suspended dust particles will scatter the laser light, resulting in a visible trace through the cavity, which is also imaged from below with a video camera. The electrical characteristics of the plasma (current, voltage, impedance, dissipated power) are determined using a commercially available plasma impedance monitor. All of these techniques are time resolved and are complemented with scanning and transmission electron microscopy of the grown dust particles to infer their sizes. We conclude by presenting an overview of approaches for future research predominantly aimed at the interactions in a more EUV-like environment.

M3 - Poster

ER -

Wetering, van de FMJH, Nijdam S, Kroesen GMW. Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments. 2012. Poster session presented at 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012), Kerkrade, Netherlands.