Abstract
| Original language | English |
|---|---|
| Publication status | Published - 2012 |
| Event | 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012) - Conference centre "Rolduc", Kerkrade, Netherlands Duration: 22 Nov 2012 → 23 Nov 2012 https://www.tue.nl/fileadmin/content/faculteiten/tn/PMP/Guidelines__PMP__TuMo_/announcement.pdf |
Workshop
| Workshop | 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012) |
|---|---|
| Abbreviated title | WELTPP-15 |
| Country | Netherlands |
| City | Kerkrade |
| Period | 22/11/12 → 23/11/12 |
| Internet address |
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Bibliographical note
Poster presented at the 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-15 2012), 22-23 November 2012, Kerkrade, The NetherlandsCite this
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Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments. / Wetering, van de, F.M.J.H.; Nijdam, S.; Kroesen, G.M.W.
2012. Poster session presented at 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP 2012), Kerkrade, Netherlands.Research output: Contribution to conference › Poster › Academic
TY - CONF
T1 - Characterizing dusty argon-acetylene plasmas as a first step to understand dusty EUV environments
AU - Wetering, van de, F.M.J.H.
AU - Nijdam, S.
AU - Kroesen, G.M.W.
N1 - Poster presented at the 15th Euregional Workshop on the Exploration of Low Temperature Plasma Physics (WELTPP-15 2012), 22-23 November 2012, Kerkrade, The Netherlands
PY - 2012
Y1 - 2012
N2 - In extreme ultraviolet (EUV) lithography, ionic and particulate debris coming from the plasma source plays an important role. We started up a project looking at the principles of particle formation in plasmas and the interaction with EUV radiation. To this end, we study a low-pressure (10 Pa) capacitively-coupled radio-frequency (13.56 MHz) argon-acetylene plasma. In low-pressure hydrocarbon plasmas, dust particles spontaneously form under certain conditions. The whole process occurs in a matter of seconds to minutes after igniting the plasma and results in a cloud of particulates up to micrometer sizes levitating in the plasma. Several techniques are used to gain information about the plasma dynamics. Microwave cavity resonance spectroscopy is used to determine the global electron density. Mie laser scattering is used to locally determine the dust particle density. Suspended dust particles will scatter the laser light, resulting in a visible trace through the cavity, which is also imaged from below with a video camera. The electrical characteristics of the plasma (current, voltage, impedance, dissipated power) are determined using a commercially available plasma impedance monitor. All of these techniques are time resolved and are complemented with scanning and transmission electron microscopy of the grown dust particles to infer their sizes. We conclude by presenting an overview of approaches for future research predominantly aimed at the interactions in a more EUV-like environment.
AB - In extreme ultraviolet (EUV) lithography, ionic and particulate debris coming from the plasma source plays an important role. We started up a project looking at the principles of particle formation in plasmas and the interaction with EUV radiation. To this end, we study a low-pressure (10 Pa) capacitively-coupled radio-frequency (13.56 MHz) argon-acetylene plasma. In low-pressure hydrocarbon plasmas, dust particles spontaneously form under certain conditions. The whole process occurs in a matter of seconds to minutes after igniting the plasma and results in a cloud of particulates up to micrometer sizes levitating in the plasma. Several techniques are used to gain information about the plasma dynamics. Microwave cavity resonance spectroscopy is used to determine the global electron density. Mie laser scattering is used to locally determine the dust particle density. Suspended dust particles will scatter the laser light, resulting in a visible trace through the cavity, which is also imaged from below with a video camera. The electrical characteristics of the plasma (current, voltage, impedance, dissipated power) are determined using a commercially available plasma impedance monitor. All of these techniques are time resolved and are complemented with scanning and transmission electron microscopy of the grown dust particles to infer their sizes. We conclude by presenting an overview of approaches for future research predominantly aimed at the interactions in a more EUV-like environment.
M3 - Poster
ER -