Characterization of a vacuum-arc discharge in tin vapor using time-resolved plasma imaging and extreme ultraviolet spectrometry

E.R. Kieft, J.J.A.M. Mullen, van der, G.M.W. Kroesen, V.Y. Banine, K.N. Koshelev

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

Discharge sources in tin vapor have recently been receiving increased attention as candidate extreme ultraviolet (EUV) light sources for application in semiconductor lithography, because of their favorable spectrum near 13.5 nm. In the ASML EUV laboratory, time-resolved pinhole imaging in the EUV and two-dimensional imaging in visible light have been applied for qualitative characterization of the evolution of a vacuum-arc tin vapor discharge. An EUV spectrometer has been used to find the dominant ionization stages of tin as a function of time during the plasma evolution of the discharge.
Original languageEnglish
Article number026409
Pages (from-to)026409-1/7
Number of pages7
JournalPhysical Review E - Statistical, Nonlinear, and Soft Matter Physics
Volume71
Issue number2
DOIs
Publication statusPublished - 2005

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