Characterisation of the growth of a carbonaceous film on silicon

J.P. Beardmore, A.J. Palmer, C.G.C.H.M. Fabrie, K.A.H. Leeuwen, van, R.T. Sang

Research output: Contribution to journalArticleAcademicpeer-review


In this paper we present the first characterisation of growth of a carbonaceous film on a silicon substrate exposed to a metastable atom beam using an in situ rotating polariser ellipsometer. The initial deposition of oil due to a background partial pressure in vacuum is investigated. Subsequent exposure of the deposited oil to a high flux metastable neon (Ne*) beam results in cross-linking of the oil film, creating a polymerised carbonaceous layer. Values for the mean residence time, polymerisation cross-section, and desorption cross-section are calculated and compared to similar studies performed for ion bombardment. Simple estimates can provide reasonable values for application of the theory to other systems.
Original languageEnglish
Pages (from-to)2414-2417
JournalThin Solid Films
Issue number7
Publication statusPublished - 2012


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