Characterisation of plasmas produced by the "torche à injection axiale"

J. Jonkers, L.J.M. Selen, J.J.A.M. Mullen, van der, E.A.H. Timmermans, D.C. Schram

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Abstract

Two different kinds of plasmas created by the microwave driven Torche a' Injection Axiale (TIA) are investigated: one with helium and the other with argon as the main gas. By using abs. line intensity measurements, the densities of the excited states are detd. Applying the ideal gas law gives the ground state d. It is found that both plasmas are ionizing and that the excitation temps. range from 3000 to 11,000 K. The electron temp. and the electron d. are detd. using Thomson scattering. In the plasma with helium as the main gas, av. densities between 0.64 and 5.1 x 1020 m-3 and temps. around 25,000 K are found. In an argon plasma, the electron temp. is lower and the electron d. is higher: 17,000 K and around 1021 m-3 resp. Radial profiles of the electron d., obtained by focusing the laser beam, appear to have a donut-like shape. [on SciFinder (R)]
Original languageEnglish
Title of host publicationProgress in Plasma Processing of Materials 1997 ; Proceedings of the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996
EditorsP. Fauchais
Place of PublicationNew York
PublisherBegell House Inc.
Pages109-117
ISBN (Print)1-56700-093-2
Publication statusPublished - 1997
Eventconference; Progress in Plasma Processing of Materials 1997 ; the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996; 1996-07-18; 1996-07-18 -
Duration: 18 Jul 199618 Jul 1996

Conference

Conferenceconference; Progress in Plasma Processing of Materials 1997 ; the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996; 1996-07-18; 1996-07-18
Period18/07/9618/07/96
OtherProgress in Plasma Processing of Materials 1997 ; the 4th International Thermal Plasma Processes Conference, Athens, July 15-18, 1996

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