TY - JOUR
T1 - Cavity ring down detection of SiH3 on the broadband à 2A1′ ←X 2A1 transition in a remote Ar–H2–SiH4 plasma
AU - Boogaarts, M.G.H.
AU - Bocker, P.J.
AU - Kessels, W.M.M.
AU - Schram, D.C.
AU - Sanden, van de, M.C.M.
PY - 2000
Y1 - 2000
N2 - We report on the use of the cavity ring down (CRD) technique for the detection of the silyl radical SiH/sub 3/ on the broadband A/sup 2/A'/sub 1/ from X/sup 2/A/sub 1/ transition around 215 nm. SiH/sub 3/ has been detected in a remote Ar-H/sub 2/-SiH/sub 4/ plasma during hydrogenated amorphous silicon (a-Si:H) thin film growth. The measurements demonstrate the capability of CRD to measure small broadband absorptions in the deep UV in the hostile environment of a deposition plasma. The SiH/sub 3/ absorption shows an expected dependence on the SiH/sub 4/ precursor flow and correlates well with the a-Si:H growth rate. The observed absorptions correspond with SiH/sub 3/ densities in the range 2-13*10/sup 18/ m/sup -3/, which is at least two orders of magnitude above the estimated SiH/sub 3/ detection limit
AB - We report on the use of the cavity ring down (CRD) technique for the detection of the silyl radical SiH/sub 3/ on the broadband A/sup 2/A'/sub 1/ from X/sup 2/A/sub 1/ transition around 215 nm. SiH/sub 3/ has been detected in a remote Ar-H/sub 2/-SiH/sub 4/ plasma during hydrogenated amorphous silicon (a-Si:H) thin film growth. The measurements demonstrate the capability of CRD to measure small broadband absorptions in the deep UV in the hostile environment of a deposition plasma. The SiH/sub 3/ absorption shows an expected dependence on the SiH/sub 4/ precursor flow and correlates well with the a-Si:H growth rate. The observed absorptions correspond with SiH/sub 3/ densities in the range 2-13*10/sup 18/ m/sup -3/, which is at least two orders of magnitude above the estimated SiH/sub 3/ detection limit
U2 - 10.1016/S0009-2614(00)00795-8
DO - 10.1016/S0009-2614(00)00795-8
M3 - Article
SN - 0009-2614
VL - 326
SP - 400
EP - 406
JO - Chemical Physics Letters
JF - Chemical Physics Letters
IS - 5-6
ER -