Original language | English |
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Title of host publication | Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November, Technische Universiteit Eindhoven |
Editors | X.J.M. Leijtens, D. Pustakhod |
Place of Publication | Eindhoven |
Publisher | Eindhoven University of Technology |
Pages | 167-170 |
ISBN (Print) | 978-90-386-3512-5 |
Publication status | Published - 2013 |
C60-assisted electron-beam lithography for loss reduction in InP membrane waveguides
Y. Jiao, J. Pello, E. Smalbrugge, E.J. Geluk, M.K. Smit, J.J.G.M. Tol, van der
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
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