C60-assisted electron-beam lithography for loss reduction in InP membrane waveguides

Y. Jiao, J. Pello, E. Smalbrugge, E.J. Geluk, M.K. Smit, J.J.G.M. Tol, van der

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)
78 Downloads (Pure)
Original languageEnglish
Title of host publicationProceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November, Technische Universiteit Eindhoven
EditorsX.J.M. Leijtens, D. Pustakhod
Place of PublicationEindhoven
PublisherEindhoven University of Technology
Pages167-170
ISBN (Print)978-90-386-3512-5
Publication statusPublished - 2013

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