Branched block copolymers for tuning of morphology and feature size in thin film nanolithography

H. Minehara, L.M. Pitet, S. Kim, R.H. Zha, E. W. Meijer, C.J. Hawker

Research output: Contribution to journalArticleAcademicpeer-review

32 Citations (Scopus)

Abstract

A library of Y-shaped poly(dimethylsiloxane) (PDMS)-b-poly(d,l-lactide) (PLA) diblock copolymers and their corresponding linear counterparts were synthesized, and their morphologies and feature sizes in bulk and thin films were compared using small-angle X-ray scattering (SAXS), scanning force microscopy (SFM), and grazing incidence small-angle X-ray scattering (GI-SAXS). For macromolecular isomers with approximately the same molecular weights and volume fractions (PLA fL: 0.20 and 0.35), different thin film morphologies were obtained for the Y-shaped PDMS-b-PLA derivatives when compared to the corresponding linear derivatives. These data also gave us the option to determine some of the key parameters of these block copolymers. A relatively high χ value of 0.24 was found for these PDMS-b-PLA systems and was shown to be influenced by architecture.

Original languageEnglish
Pages (from-to)2318-2326
Number of pages9
JournalMacromolecules
Volume49
Issue number6
DOIs
Publication statusPublished - 22 Mar 2016

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