Bias stress in organic thin-film transistors and logic gates

S.J. Zilker (Corresponding author), C. Detcheverry, E. Cantatore, D.M. De Leeuw

Research output: Contribution to journalArticleAcademicpeer-review

226 Citations (Scopus)

Abstract

Threshold voltage instabilities of all-organic thin-film transistors are investigated as a function of stress time and stress bias. The dominant effect is a positive threshold shift for negative gate bias stress which is explained by mobile ions drifting in the insulator when a gate field is applied. Trapping of charge carriers at the semiconductor-insulator interface plays only a minor role. Furthermore, we investigate the stress behavior of a basic logic element, an inverter. In comparison to a single transistor, we observe improved stability which arises from partial compensation of the parametric shifts during operation.

Original languageEnglish
Pages (from-to)1124-1126
Number of pages3
JournalApplied Physics Letters
Volume79
Issue number8
DOIs
Publication statusPublished - 20 Aug 2001
Externally publishedYes

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