Atomic layer deposition: prospects for solar cell manufacturing

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

4 Citations (Scopus)

Abstract

Atomic layer deposition (ALD) is a thin film growth technology that is capable of depositing uniform and conformal films on complex, three-dimensional objects with atomic precision. ALD is a rapidly growing field and it is currently at the verge of being introduced in the semiconductor industry. Recently it has been recognized that the method has also applications in many other areas relying on thin films including the area of photovoltaics. In this contribution the basics and key features of the ALD method will be described focusing especially on the potential of the method in solar cell manufacturing. It will be shown that the method is of relevance for first, second and third generation solar cells
Original languageEnglish
Title of host publicationProceedings 33rd IEEE Photovoltaic Specialist Conference, San Diego, USA
Publication statusPublished - 2008

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