Atomic layer deposition of Ru from CpRu(CO2)Et using O2 gas and O2 plasma

N. Leick, R.O.F. Verkuijlen, L. Lamagna, E. Langereis, S.A. Rushworth, F. Roozeboom, M.C.M. Sanden, van de, W.M.M. Kessels

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The metalorganic precursor cyclopentadienylethyl(dicarbonyl)ruthenium (CpRu(CO)2Et) was used to develop an atomic layer deposition (ALD) process for ruthenium. O2 gas and O2 plasma were employed as reactants. For both processes, thermal and plasma-assisted ALD, a relatively high growth-per-cycle of - 1 Å was obtained. The Ru films were dense and polycrystalline, regardless of the reactant, yielding a resistivity of - 16 µO¿cm. The O2 plasma not only enhanced the Ru nucleation on the TiN substrates but also led to an increased roughness compared to thermal ALD.
Original languageEnglish
Article number021016
Pages (from-to)021016-1/7
Number of pages7
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films
Issue number2
Publication statusPublished - 2011


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