Atomic layer deposition of HfO2 using HfCp(NMe2)3 and O2 plasma

A. Sharma, V. Longo, M.A. Verheijen, A.A. Bol, W.M.M. Kessels

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HfO2 thin films were prepared by plasma-enhanced atomic layer deposition using a cyclopentadienyl-alkylamido precursor [HfCp(NMe2)3, HyALD™] and an O2 plasma over a temperature range of 150–400 °C at a growth per cycle around 1.1 Å/cycle. The high purity of the films was demonstrated by x-ray photoelectron spectroscopy and elastic recoil detection analyses which revealed that by increasing the deposition temperature from 200 to 400 °C, the atomic concentrations of residual carbon and hydrogen reduced from 1.0 to <0.5 at. % and 3.4 to 0.8 at. %, respectively. Moreover, Rutherford backscattering spectroscopy studies showed an improvement in stoichiometry of HfO2 thin films with the increase in deposition temperature, resulting in Hf/O ratio close to ∼0.5 at 400 °C. Furthermore, grazing incidence x-ray diffraction measurements detected a transition from amorphous at the deposition temperature of 300 °C to fully polycrystalline films at 400 °C, consisting of a mixture of monoclinic, tetragonal, and cubic phases. Finally, the surface morphology and conformality of HfO2 thin films studied by atomic force microscopy and transmission electron microscopy are also reported.
Original languageEnglish
Article number01B130
Number of pages8
JournalJournal of Vacuum Science and Technology A
Issue number1
Early online dateDec 2016
Publication statusPublished - 2017


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