Atomic layer deposition of hafnium oxide on germanium substrates

Annelies Delabie, Riikka L. Puurunen, Bert Brijs, Matty Caymax, Thierry Conard, Bart Onsia, Olivier Richard, Wilfried Vandervorst, Chao Zhao, Marc M. Heyns, Marc Meuris, Minna M. Viitanen, Hidde H. Brongersma, Marco de Ridder, Lyudmila V. Goncharova, Eric Garfunkel, Torgny Gustafsson, Wilman Tsai