Abstract
Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER). In parallel, Atomic Layer Deposition (ALD) is increasingly being used in (photo)electrocatalytic applications. In this contribution we report on the electrocatalytic activity towards OER of ALD-prepared cobalt phosphate thin films. The selected ALD approach enables tuning of the Co-to-P atomic ratio, which is found to significantly affect the activity of the prepared electrocatalyst. Specifically, concurrently with a Co-to-P ratio increase from 1.6 to 1.9, the current density for OER increases from 1.77 mA/cm2 at 1.8 V vs. RHE (Reversible Hydrogen Electrode) to 2.89 mA/cm2 at 1.8 V vs. RHE. Moreover the sample with a Co-to-P ratio of 1.9 has superior performance when compared to electrodeposited cobalt phosphate thin films reported in the literature.
| Original language | English |
|---|---|
| Pages (from-to) | 73-77 |
| Number of pages | 5 |
| Journal | Electrochemistry Communications |
| Volume | 98 |
| DOIs | |
| Publication status | Published - 1 Jan 2019 |
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Keywords
- Atomic layer deposition
- Cobalt phosphate
- Electrocatalysis
- Oxygen evolution reaction
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Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction. / Di Palma, V. (Corresponding author); Zafeiropoulos, G.; Goldsweer, T.; Kessels, W. M.M.; van de Sanden, M. C.M.; Creatore, M.; Tsampas, M. N.
In: Electrochemistry Communications, Vol. 98, 01.01.2019, p. 73-77.Research output: Contribution to journal › Article › Academic › peer-review
TY - JOUR
T1 - Atomic layer deposition of cobalt phosphate thin films for the oxygen evolution reaction
AU - Di Palma, V.
AU - Zafeiropoulos, G.
AU - Goldsweer, T.
AU - Kessels, W. M.M.
AU - van de Sanden, M. C.M.
AU - Creatore, M.
AU - Tsampas, M. N.
PY - 2019/1/1
Y1 - 2019/1/1
N2 - Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER). In parallel, Atomic Layer Deposition (ALD) is increasingly being used in (photo)electrocatalytic applications. In this contribution we report on the electrocatalytic activity towards OER of ALD-prepared cobalt phosphate thin films. The selected ALD approach enables tuning of the Co-to-P atomic ratio, which is found to significantly affect the activity of the prepared electrocatalyst. Specifically, concurrently with a Co-to-P ratio increase from 1.6 to 1.9, the current density for OER increases from 1.77 mA/cm2 at 1.8 V vs. RHE (Reversible Hydrogen Electrode) to 2.89 mA/cm2 at 1.8 V vs. RHE. Moreover the sample with a Co-to-P ratio of 1.9 has superior performance when compared to electrodeposited cobalt phosphate thin films reported in the literature.
AB - Electrodeposited cobalt phosphate has been reported as a valid alternative to noble metals as an electrocatalyst for the Oxygen Evolution Reaction (OER). In parallel, Atomic Layer Deposition (ALD) is increasingly being used in (photo)electrocatalytic applications. In this contribution we report on the electrocatalytic activity towards OER of ALD-prepared cobalt phosphate thin films. The selected ALD approach enables tuning of the Co-to-P atomic ratio, which is found to significantly affect the activity of the prepared electrocatalyst. Specifically, concurrently with a Co-to-P ratio increase from 1.6 to 1.9, the current density for OER increases from 1.77 mA/cm2 at 1.8 V vs. RHE (Reversible Hydrogen Electrode) to 2.89 mA/cm2 at 1.8 V vs. RHE. Moreover the sample with a Co-to-P ratio of 1.9 has superior performance when compared to electrodeposited cobalt phosphate thin films reported in the literature.
KW - Atomic layer deposition
KW - Cobalt phosphate
KW - Electrocatalysis
KW - Oxygen evolution reaction
UR - http://www.scopus.com/inward/record.url?scp=85057894539&partnerID=8YFLogxK
U2 - 10.1016/j.elecom.2018.11.021
DO - 10.1016/j.elecom.2018.11.021
M3 - Article
AN - SCOPUS:85057894539
VL - 98
SP - 73
EP - 77
JO - Electrochemistry Communications
JF - Electrochemistry Communications
SN - 1388-2481
ER -