TY - JOUR
T1 - Atom lithography without laser cooling
AU - Smeets, B.
AU - Straten, van der, P.
AU - Meijer, T.
AU - Fabrie, C.G.C.H.M.
AU - Leeuwen, van, K.A.H.
PY - 2010
Y1 - 2010
N2 - Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
AB - Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
U2 - 10.1007/s00340-009-3867-3
DO - 10.1007/s00340-009-3867-3
M3 - Article
SN - 0946-2171
VL - 98
SP - 697
EP - 705
JO - Applied Physics B: Lasers and Optics
JF - Applied Physics B: Lasers and Optics
IS - 4
ER -