Atom lithography without laser cooling

B. Smeets, P. Straten, van der, T. Meijer, C.G.C.H.M. Fabrie, K.A.H. Leeuwen, van

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
Original languageEnglish
Pages (from-to)697-705
Number of pages9
JournalApplied Physics B: Lasers and Optics
Volume98
Issue number4
DOIs
Publication statusPublished - 2010

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