Atom lithography of Fe

E. Sligte, te; B. Smeets; K.M.R. van der Stam; R.W. Herfst; P. Straten, van der; H.C.W. Beijerinck; K.A.H. Leeuwen, van

doi:10.1063/1.1818347

Atom lithography of Fe

E. Sligte, te, B. Smeets, K.M.R. van der Stam, R.W. Herfst, P. Straten, van der, H.C.W. Beijerinck, K.A.H. Leeuwen, van

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Abstract

Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics

Original language	English
Pages (from-to)	4493-4495
Journal	Applied Physics Letters
Volume	85
Issue number	19
DOIs	https://doi.org/10.1063/1.1818347
Publication status	Published - 2004

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title = "Atom lithography of Fe",

abstract = "Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics",

author = "{Sligte, te}, E. and B. Smeets and {van der Stam}, K.M.R. and R.W. Herfst and {Straten, van der}, P. and H.C.W. Beijerinck and {Leeuwen, van}, K.A.H.",

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AU - Sligte, te, E.

AU - Smeets, B.

AU - van der Stam, K.M.R.

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AU - Straten, van der, P.

AU - Beijerinck, H.C.W.

AU - Leeuwen, van, K.A.H.

PY - 2004

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N2 - Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics

AB - Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics

U2 - 10.1063/1.1818347

DO - 10.1063/1.1818347

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VL - 85

SP - 4493

EP - 4495

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 19

ER -

Atom lithography of Fe

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