Atom lithography of Fe

E. Sligte, te, B. Smeets, K.M.R. van der Stam, R.W. Herfst, P. Straten, van der, H.C.W. Beijerinck, K.A.H. Leeuwen, van

    Research output: Contribution to journalArticleAcademicpeer-review

    35 Citations (Scopus)
    54 Downloads (Pure)

    Abstract

    Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372 nm laser light standing wave to pattern a beam of iron atoms. In this proof-of-principle experiment, we have deposited a grid of 50-nm-wide lines 186 nm apart. These ultraregular, large-scale, ferromagnetic wire arrays may generate exciting new developments in the fields of spintronics and nanomagnetics
    Original languageEnglish
    Pages (from-to)4493-4495
    JournalApplied Physics Letters
    Volume85
    Issue number19
    DOIs
    Publication statusPublished - 2004

    Fingerprint Dive into the research topics of 'Atom lithography of Fe'. Together they form a unique fingerprint.

    Cite this