Atmospheric pressure plasma enhanced chemical vapour deposition of silica : understanding the role of the local deposition rate in the surface and film morphology

A. Meshkova

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

169 Downloads (Pure)

Abstract

Understanding flexible moisture barrier layers
Original languageEnglish
QualificationDoctor of Philosophy
Awarding Institution
  • Department of Applied Physics
Supervisors/Advisors
  • van de Sanden, M.C.M. (Richard), Promotor
  • de Vries, H.W., Copromotor
Award date4 Dec 2018
Place of PublicationEindhoven
Publisher
Print ISBNs978-90-386-4652-7
Publication statusPublished - 4 Dec 2018

Fingerprint

atmospheric pressure
silica
moisture
plasma
rate
chemical

Bibliographical note

Proefschrift

Keywords

  • 11:00h, Auditorium, Zaal 4

Promotion : time and place

  • 11:00h, Auditorium, Senaatszaal

Cite this

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Atmospheric pressure plasma enhanced chemical vapour deposition of silica : understanding the role of the local deposition rate in the surface and film morphology. / Meshkova, A.

Eindhoven : Technische Universiteit Eindhoven, 2018. 149 p.

Research output: ThesisPhd Thesis 1 (Research TU/e / Graduation TU/e)

TY - THES

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AU - Meshkova, A.

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Y1 - 2018/12/4

N2 - Understanding flexible moisture barrier layers

AB - Understanding flexible moisture barrier layers

KW - 11:00h, Auditorium, Zaal 4

M3 - Phd Thesis 1 (Research TU/e / Graduation TU/e)

SN - 978-90-386-4652-7

PB - Technische Universiteit Eindhoven

CY - Eindhoven

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