Abstract
Transparent conductive oxide (TCO) coated glass is widely used in thin film PV. Atmospheric pressure chemical vapor deposition (APCVD) is a highly cost effective method of deposition and apart from metal precursor and oxygen precursor, other additives can improve the layer quality. In this contribution, we present an overview of the latest results on SnO2 and ZnO work. First, the beneficial effect of methanol addition is discussed. By adding methanol during the SnO2 deposition, the conductivity increased up to ten times, with remarkably high mobility values of up to 55 cm2/Vs. The films are already very conductive at a thickness below 10 nm. This is highly beneficial to applications with strict requirements in terms of film transparency. For ZnO:Al the APCVD process was developed with a deposition rate of 14 nm/s for one injector and resistivity values down to 0.6 mΩ cm. Low temperature APCVD ZnO was achieved by introducing remote plasma in the system. Deposition rate of 7 nm/s and resistivities of 2 mΩ cm were obtained. For spatial ALD, growth rates of ZnO were up to 1 nm/s and resistivities were of the order of 4 mΩ cm.
Original language | English |
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Title of host publication | Program - 38th IEEE Photovoltaic Specialists Conference, PVSC 2012 |
Pages | 2014-2017 |
Number of pages | 4 |
DOIs | |
Publication status | Published - 26 Nov 2012 |
Event | 38th IEEE Photovoltaic Specialists Conference (PVSC 2012) - Austin Convention Center, Austin, United States Duration: 3 Jun 2012 → 8 Jun 2012 Conference number: 38 https://www.ieee-pvsc.org/PVSC38/ |
Conference
Conference | 38th IEEE Photovoltaic Specialists Conference (PVSC 2012) |
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Abbreviated title | PVSC 2012 |
Country/Territory | United States |
City | Austin |
Period | 3/06/12 → 8/06/12 |
Internet address |
Keywords
- CVD
- tinoxide
- transparent conductive oxides
- transparent conductors
- zincoxide