Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

Martijn F.J. Vos; Sonali N. Chopra; Marcel A. Verheijen; John G. Ekerdt; Sumit Agarwal; Wilhelmus M.M. Kessels; Adriaan J.M. Mackus

doi:10.1021/acs.chemmater.9b00193

Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

Martijn F.J. Vos, Sonali N. Chopra, Marcel A. Verheijen, John G. Ekerdt, Sumit Agarwal, Wilhelmus M.M. Kessels, Adriaan J.M. Mackus (Corresponding author)

Research output: Contribution to journal › Article › Academic › peer-review

43 Citations (Scopus)

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Original language	English
Pages (from-to)	3878-3882
Number of pages	5
Journal	Chemistry of Materials
Volume	31
Issue number	11
DOIs	https://doi.org/10.1021/acs.chemmater.9b00193
Publication status	Published - 22 May 2019

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10.1021/acs.chemmater.9b00193

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@article{acd3384010564233b2dd893cbdc1a985,

title = "Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching",

author = "Vos, {Martijn F.J.} and Chopra, {Sonali N.} and Verheijen, {Marcel A.} and Ekerdt, {John G.} and Sumit Agarwal and Kessels, {Wilhelmus M.M.} and Mackus, {Adriaan J.M.}",

year = "2019",

month = may,

day = "22",

doi = "10.1021/acs.chemmater.9b00193",

language = "English",

volume = "31",

pages = "3878--3882",

journal = "Chemistry of Materials",

issn = "0897-4756",

publisher = "American Chemical Society",

number = "11",

}

Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching. / Vos, Martijn F.J.; Chopra, Sonali N.; Verheijen, Marcel A.; Ekerdt, John G.; Agarwal, Sumit; Kessels, Wilhelmus M.M.; Mackus, Adriaan J.M. (Corresponding author).

In: Chemistry of Materials, Vol. 31, No. 11, 22.05.2019, p. 3878-3882.

Research output: Contribution to journal › Article › Academic › peer-review

TY - JOUR

T1 - Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

AU - Vos, Martijn F.J.

AU - Chopra, Sonali N.

AU - Verheijen, Marcel A.

AU - Ekerdt, John G.

AU - Agarwal, Sumit

AU - Kessels, Wilhelmus M.M.

AU - Mackus, Adriaan J.M.

PY - 2019/5/22

Y1 - 2019/5/22

UR - http://www.scopus.com/inward/record.url?scp=85066404295&partnerID=8YFLogxK

U2 - 10.1021/acs.chemmater.9b00193

DO - 10.1021/acs.chemmater.9b00193

M3 - Article

AN - SCOPUS:85066404295

VL - 31

SP - 3878

EP - 3882

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 11

ER -

Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

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