Original language | English |
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Pages (from-to) | 3878-3882 |
Number of pages | 5 |
Journal | Chemistry of Materials |
Volume | 31 |
Issue number | 11 |
DOIs | |
Publication status | Published - 22 May 2019 |
Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching
Martijn F.J. Vos, Sonali N. Chopra, Marcel A. Verheijen, John G. Ekerdt, Sumit Agarwal, Wilhelmus M.M. Kessels, Adriaan J.M. Mackus (Corresponding author)
Research output: Contribution to journal › Article › Academic › peer-review
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