Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

Martijn F.J. Vos, Sonali N. Chopra, Marcel A. Verheijen, John G. Ekerdt, Sumit Agarwal, Wilhelmus M.M. Kessels, Adriaan J.M. Mackus (Corresponding author)

Research output: Contribution to journal › Article › Academic › peer-review

1 Citation (Scopus)
57 Downloads (Pure)
Original languageEnglish
Pages (from-to)3878-3882
Number of pages5
JournalChemistry of Materials
Volume31
Issue number11
DOIs
Publication statusPublished - 22 May 2019

Cite this

Vos, Martijn F.J. ; Chopra, Sonali N. ; Verheijen, Marcel A. ; Ekerdt, John G. ; Agarwal, Sumit ; Kessels, Wilhelmus M.M. ; Mackus, Adriaan J.M. / Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching. In: Chemistry of Materials. 2019 ; Vol. 31, No. 11. pp. 3878-3882.
@article{acd3384010564233b2dd893cbdc1a985,
title = "Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching",
author = "Vos, {Martijn F.J.} and Chopra, {Sonali N.} and Verheijen, {Marcel A.} and Ekerdt, {John G.} and Sumit Agarwal and Kessels, {Wilhelmus M.M.} and Mackus, {Adriaan J.M.}",
year = "2019",
month = "5",
day = "22",
doi = "10.1021/acs.chemmater.9b00193",
language = "English",
volume = "31",
pages = "3878--3882",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society",
number = "11",

}

Vos, MFJ, Chopra, SN, Verheijen, MA, Ekerdt, JG, Agarwal, S, Kessels, WMM & Mackus, AJM 2019, 'Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching', Chemistry of Materials, vol. 31, no. 11, pp. 3878-3882. https://doi.org/10.1021/acs.chemmater.9b00193

Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching. / Vos, Martijn F.J.; Chopra, Sonali N.; Verheijen, Marcel A.; Ekerdt, John G.; Agarwal, Sumit; Kessels, Wilhelmus M.M.; Mackus, Adriaan J.M. (Corresponding author).

In: Chemistry of Materials, Vol. 31, No. 11, 22.05.2019, p. 3878-3882.

Research output: Contribution to journal › Article › Academic › peer-review

TY - JOUR

T1 - Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

AU - Vos, Martijn F.J.

AU - Chopra, Sonali N.

AU - Verheijen, Marcel A.

AU - Ekerdt, John G.

AU - Agarwal, Sumit

AU - Kessels, Wilhelmus M.M.

AU - Mackus, Adriaan J.M.

PY - 2019/5/22

Y1 - 2019/5/22

UR - http://www.scopus.com/inward/record.url?scp=85066404295&partnerID=8YFLogxK

U2 - 10.1021/acs.chemmater.9b00193

DO - 10.1021/acs.chemmater.9b00193

M3 - Article

AN - SCOPUS:85066404295

VL - 31

SP - 3878

EP - 3882

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 11

ER -

Vos MFJ, Chopra SN, Verheijen MA, Ekerdt JG, Agarwal S, Kessels WMM et al. Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching. Chemistry of Materials. 2019 May 22;31(11):3878-3882. https://doi.org/10.1021/acs.chemmater.9b00193

Access to Document