Area-selective deposition of Ruthenium by combining atomic layer deposition and selective etching

Martijn F.J. Vos, Sonali N. Chopra, Marcel A. Verheijen, John G. Ekerdt, Sumit Agarwal, Wilhelmus M.M. Kessels, Adriaan J.M. Mackus (Corresponding author)

Research output: Contribution to journalArticleAcademicpeer-review

21 Citations (Scopus)
164 Downloads (Pure)
Original languageEnglish
Pages (from-to)3878-3882
Number of pages5
JournalChemistry of Materials
Volume31
Issue number11
DOIs
Publication statusPublished - 22 May 2019

Cite this