Area-selective atomic layer deposition of ln2O3:H using a µ-plasma printer for local area activation

Research output: Contribution to journalArticleAcademicpeer-review

18 Citations (Scopus)
91 Downloads (Pure)
Original languageEnglish
Pages (from-to)921-925
JournalChemistry of Materials
Volume29
Issue number3
DOIs
Publication statusPublished - 2017

Cite this

@article{50d2b2e7cf88498f8ed419b503e598cd,
title = "Area-selective atomic layer deposition of ln2O3:H using a µ-plasma printer for local area activation",
author = "A. Mameli and Y. Kuang and M. Aghaee and C.K. Ande and B. Karasulu and M. Creatore and A.J.M. Mackus and W.M.M. Kessels and F. Roozeboom",
year = "2017",
doi = "10.1021/acs.chemmater.6b04469",
language = "English",
volume = "29",
pages = "921--925",
journal = "Chemistry of Materials",
issn = "0897-4756",
publisher = "American Chemical Society",
number = "3",

}

Area-selective atomic layer deposition of ln2O3:H using a µ-plasma printer for local area activation. / Mameli, A.; Kuang, Y.; Aghaee, M.; Ande, C.K.; Karasulu, B.; Creatore, M.; Mackus, A.J.M.; Kessels, W.M.M.; Roozeboom, F.

In: Chemistry of Materials, Vol. 29, No. 3, 2017, p. 921-925.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - Area-selective atomic layer deposition of ln2O3:H using a µ-plasma printer for local area activation

AU - Mameli, A.

AU - Kuang, Y.

AU - Aghaee, M.

AU - Ande, C.K.

AU - Karasulu, B.

AU - Creatore, M.

AU - Mackus, A.J.M.

AU - Kessels, W.M.M.

AU - Roozeboom, F.

PY - 2017

Y1 - 2017

U2 - 10.1021/acs.chemmater.6b04469

DO - 10.1021/acs.chemmater.6b04469

M3 - Article

C2 - 28405058

VL - 29

SP - 921

EP - 925

JO - Chemistry of Materials

JF - Chemistry of Materials

SN - 0897-4756

IS - 3

ER -