Area-scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication

H. Boeve, R.J.M. Veerdonk, van de, B. Dutta, J. De Boeck, J.S. Moodera, G. Borghs

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

20 Citations (Scopus)
Original languageEnglish
Title of host publicationProc. of the 7th Joint MMM/Intermag conference
Place of PublicationSan Francisco, California, USA
Pages6700-6702
DOIs
Publication statusPublished - 1998
Event7th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference (MMM-INTERMAG 1998), January 6-9, 1998, San Francisco, CA, USA - San Francisco, CA, United States
Duration: 6 Jan 19989 Jan 1998

Publication series

NameJournal of Applied Physics
Volume83
ISSN (Print)0021-8979

Conference

Conference7th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference (MMM-INTERMAG 1998), January 6-9, 1998, San Francisco, CA, USA
Abbreviated titleMMM-INTERMAG 1998
CountryUnited States
CitySan Francisco, CA
Period6/01/989/01/98

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