Area-scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication

H. Boeve; R.J.M. Veerdonk, van de; B. Dutta; J. De Boeck; J.S. Moodera; G. Borghs

doi:10.1063/1.367839

Area-scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication

H. Boeve, R.J.M. Veerdonk, van de, B. Dutta, J. De Boeck, J.S. Moodera, G. Borghs

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Proc. of the 7th Joint MMM/Intermag conference
Place of Publication	San Francisco, California, USA
Pages	6700-6702
DOIs	https://doi.org/10.1063/1.367839
Publication status	Published - 1998
Event	7th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference (MMM-INTERMAG 1998), January 6-9, 1998, San Francisco, CA, USA - San Francisco, CA, United States Duration: 6 Jan 1998 → 9 Jan 1998

Publication series

Name	Journal of Applied Physics
Volume	83
ISSN (Print)	0021-8979

Conference

Conference	7th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference (MMM-INTERMAG 1998), January 6-9, 1998, San Francisco, CA, USA
Abbreviated title	MMM-INTERMAG 1998
Country/Territory	United States
City	San Francisco, CA
Period	6/01/98 → 9/01/98

Access to Document

10.1063/1.367839

Cite this

@inproceedings{ab30d71a5d1248979d7accd46c6fdbd5,

title = "Area-scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication",

author = "H. Boeve and {Veerdonk, van de}, R.J.M. and B. Dutta and {De Boeck}, J. and J.S. Moodera and G. Borghs",

year = "1998",

doi = "10.1063/1.367839",

language = "English",

series = "Journal of Applied Physics",

pages = "6700--6702",

booktitle = "Proc. of the 7th Joint MMM/Intermag conference",

note = "7th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference (MMM-INTERMAG 1998), January 6-9, 1998, San Francisco, CA, USA, MMM-INTERMAG 1998 ; Conference date: 06-01-1998 Through 09-01-1998",

}

Boeve, H, Veerdonk, van de, RJM, Dutta, B, De Boeck, J, Moodera, JS & Borghs, G 1998, Area-scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication. in Proc. of the 7th Joint MMM/Intermag conference. Journal of Applied Physics, vol. 83, San Francisco, California, USA, pp. 6700-6702, 7th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference (MMM-INTERMAG 1998), January 6-9, 1998, San Francisco, CA, USA, San Francisco, CA, United States, 6/01/98. https://doi.org/10.1063/1.367839

Area-scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication. / Boeve, H.; Veerdonk, van de, R.J.M.; Dutta, B. et al.

Proc. of the 7th Joint MMM/Intermag conference. San Francisco, California, USA, 1998. p. 6700-6702 (Journal of Applied Physics; Vol. 83).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Area-scaling of planar ferromagnetic tunnel junctions: From shadow evaporation to lithographic microfabrication

AU - Boeve, H.

AU - Veerdonk, van de, R.J.M.

AU - Dutta, B.

AU - De Boeck, J.

AU - Moodera, J.S.

AU - Borghs, G.

PY - 1998

Y1 - 1998

U2 - 10.1063/1.367839

DO - 10.1063/1.367839

M3 - Conference contribution

T3 - Journal of Applied Physics

SP - 6700

EP - 6702

BT - Proc. of the 7th Joint MMM/Intermag conference

CY - San Francisco, California, USA

T2 - 7th Joint Magnetism and Magnetic Materials Conference/International Magnetics Conference (MMM-INTERMAG 1998), January 6-9, 1998, San Francisco, CA, USA

Y2 - 6 January 1998 through 9 January 1998

ER -