Application of Ru-based gate materials for CMOS technology

M. Ťapajna, P. Písečny, R. Lupták, K. Hušeková, K. Fröhlich, L. Harmatha, J.C. Hooker, F. Roozeboom, J. Jergel

Research output: Contribution to journalArticleAcademicpeer-review

39 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Application of Ru-based gate materials for CMOS technology'. Together they form a unique fingerprint.

Material Science