Original language | English |
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Title of host publication | Proceedings of ISSM '98, the 7th international symposium on semiconductor manufacturing : October 7-9, Tokyo, Japan |
Editors | T. Kawanishi, T. Ohmi, H. Sasaki |
Place of Publication | Tokyo |
Publisher | Ultra Clean Technology |
Pages | 69-72 |
Publication status | Published - 1998 |
Application of a layout design method to the dielectric deposition area in a 300 mm wafer fab
P.A.M. Haagh, A.U. Wilkens, E.J.J. Campen, van, J.E. Rooda, H.J.A. Rulkens
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic