Apparatus suitable for plasma surface treating and process for preparing membrane layers

H.J.A. Schuurmans; J. Werner; D.C. Schram; G.M.W. Kroesen; Shell International Research (NL)

Apparatus suitable for plasma surface treating and process for preparing membrane layers

H.J.A. Schuurmans (Inventor), J. Werner (Inventor), D.C. Schram (Inventor), G.M.W. Kroesen (Inventor), Shell International Research (NL) (Inventor)

Plasma & Materials Processing

Research output: Patent › Patent publication

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Abstract

The invention relates to an apparatus suitable for plasma surface treating (e.g. forming a membrane layer on a substrate) which comprises a plasma generation section (2) which is in communication via at least one plasma inlet means (4) (e.g. a nozzle) with an enclosed plasma treating section (3) which is operable at a lower pressure than the plasma generation section (2), and wherein the plasma treating-section (3) is in communication with inlet means (10) for a fluid (e.g. polymerizable) reactant. The invention furthermore relates to a process for preparing membrane layers employing such an apparatus.

Original language	English
Publication status	Published - 1988

Bibliographical note

Patent EP0295752 (B1) 1988-12-21 ; US5120568 1992-06-09 ; AU597832 1990-06-07 ; AU1764988 1988-12-22 ; DE386716D 1992-03-05 ; GB8713986 1987-07-22 ; JP1100265 1989-04-18

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ep0295752 b1Final published version, 877 KB

Cite this

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title = "Apparatus suitable for plasma surface treating and process for preparing membrane layers",

abstract = "The invention relates to an apparatus suitable for plasma surface treating (e.g. forming a membrane layer on a substrate) which comprises a plasma generation section (2) which is in communication via at least one plasma inlet means (4) (e.g. a nozzle) with an enclosed plasma treating section (3) which is operable at a lower pressure than the plasma generation section (2), and wherein the plasma treating-section (3) is in communication with inlet means (10) for a fluid (e.g. polymerizable) reactant. The invention furthermore relates to a process for preparing membrane layers employing such an apparatus.",

author = "H.J.A. Schuurmans and J. Werner and D.C. Schram and G.M.W. Kroesen and {Shell International Research (NL)}",

year = "1988",

language = "English",

type = "Patent",

}

TY - PAT

T1 - Apparatus suitable for plasma surface treating and process for preparing membrane layers

AU - Schuurmans, H.J.A.

AU - Werner, J.

AU - Schram, D.C.

AU - Kroesen, G.M.W.

AU - Shell International Research (NL)

N1 - Patent EP0295752 (B1) 1988-12-21 ; US5120568 1992-06-09 ; AU597832 1990-06-07 ; AU1764988 1988-12-22 ; DE386716D 1992-03-05 ; GB8713986 1987-07-22 ; JP1100265 1989-04-18

PY - 1988

Y1 - 1988

N2 - The invention relates to an apparatus suitable for plasma surface treating (e.g. forming a membrane layer on a substrate) which comprises a plasma generation section (2) which is in communication via at least one plasma inlet means (4) (e.g. a nozzle) with an enclosed plasma treating section (3) which is operable at a lower pressure than the plasma generation section (2), and wherein the plasma treating-section (3) is in communication with inlet means (10) for a fluid (e.g. polymerizable) reactant. The invention furthermore relates to a process for preparing membrane layers employing such an apparatus.

AB - The invention relates to an apparatus suitable for plasma surface treating (e.g. forming a membrane layer on a substrate) which comprises a plasma generation section (2) which is in communication via at least one plasma inlet means (4) (e.g. a nozzle) with an enclosed plasma treating section (3) which is operable at a lower pressure than the plasma generation section (2), and wherein the plasma treating-section (3) is in communication with inlet means (10) for a fluid (e.g. polymerizable) reactant. The invention furthermore relates to a process for preparing membrane layers employing such an apparatus.

M3 - Patent publication

ER -

Apparatus suitable for plasma surface treating and process for preparing membrane layers

Abstract

Bibliographical note

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