Apparatus for processing an object with high position accurancy

J. Eijk, van (Inventor), A.F. Bakker (Inventor), D.E. Bos (Inventor), J.C. Compter (Inventor), A.C.P. Klerk (Inventor), F.M. Roes (Inventor), H.G.J.J.A. Vroomen (Inventor), T.P.H. Warmerdam (Inventor)

Research output: PatentPatent publication

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A apparatus processes an object (19), such as a semi-conductor wafer at accurately controlled positions. The object (19) is supported by a working platform (12) that is moveable along a path. A suspension actuator part (14) attached to the working platform (12), contains a soft magnetic core (24) with poles facing the surface of a soft magnetic element (34) on the support structure along the path and a winding (20) for application of a current to generate a magnetic field that runs through the core (24) via the poles and returns via the soft magnetic element (34). A sensor (17) senses a measured position of the suspension actuator part (14) relative to the position reference element (16). A control circuit comprises an outer control circuit (40) and an inner control circuit (42).; The outer control circuit (40) receives a sensing result and determines force set point information to regulate the measured position of the actuator part (14) to a required value. The inner control circuit (42) receives the force set point information and controls the current to realize a force between the actuator part (14) and the support structure (10) according to the force set point information
Original languageEnglish
Patent numberUS7375479
Publication statusPublished - 20 May 2008


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