Analysis of Etch Depth for Polarization-free Directional Couplers

Ali Emre Kaplan; Jos J.G.M. van der Tol; Paolo Bassi; Gaetano Bellanca

doi:10.1109/ICOP49690.2020.9300314

Analysis of Etch Depth for Polarization-free Directional Couplers

Ali Emre Kaplan, Jos J.G.M. van der Tol, Paolo Bassi, Gaetano Bellanca

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

We numerically analyze the etch depth as a design parameter for the realization of integrated polarization independent directional couplers. Through finite-element-method simulations, the coupling coefficients of transverse-electric (TE) and transverse-magnetic (TM) polarizations are investigated according to different etch depth levels in the coupling section of the studied device. By optimizing etching depth, the proposed coupler can perform similarly for both polarizations in broadband. According to simulation results, the minimum difference between the TE and TM coupling coefficients can be kept less than 1% in 100 nm of the wavelength range.

Original language	English
Title of host publication	Proceedings of 2020 Italian Conference on Optics and Photonics, ICOP 2020
Editors	Silvia Maria Pietralunga, Stefano Selleri
Publisher	Institute of Electrical and Electronics Engineers
Number of pages	4
ISBN (Electronic)	9781728162393
DOIs	https://doi.org/10.1109/ICOP49690.2020.9300314
Publication status	Published - 25 Dec 2020
Event	2020 Italian Conference on Optics and Photonics, ICOP 2020 - Parma, Italy Duration: 8 Sept 2020 → 11 Sept 2020

Conference

Conference	2020 Italian Conference on Optics and Photonics, ICOP 2020
Country/Territory	Italy
City	Parma
Period	8/09/20 → 11/09/20

Bibliographical note

Publisher Copyright:
© 2020 IEEE.

Copyright:
Copyright 2021 Elsevier B.V., All rights reserved.

Keywords

directional couplers
photonic integrated circuits
polarization-independent circuits

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10.1109/ICOP49690.2020.9300314

Cite this

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title = "Analysis of Etch Depth for Polarization-free Directional Couplers",

abstract = "We numerically analyze the etch depth as a design parameter for the realization of integrated polarization independent directional couplers. Through finite-element-method simulations, the coupling coefficients of transverse-electric (TE) and transverse-magnetic (TM) polarizations are investigated according to different etch depth levels in the coupling section of the studied device. By optimizing etching depth, the proposed coupler can perform similarly for both polarizations in broadband. According to simulation results, the minimum difference between the TE and TM coupling coefficients can be kept less than 1% in 100 nm of the wavelength range.",

keywords = "directional couplers, photonic integrated circuits, polarization-independent circuits",

author = "Kaplan, {Ali Emre} and {van der Tol}, {Jos J.G.M.} and Paolo Bassi and Gaetano Bellanca",

note = "Publisher Copyright: {\textcopyright} 2020 IEEE. Copyright: Copyright 2021 Elsevier B.V., All rights reserved.; 2020 Italian Conference on Optics and Photonics, ICOP 2020 ; Conference date: 08-09-2020 Through 11-09-2020",

year = "2020",

month = dec,

day = "25",

doi = "10.1109/ICOP49690.2020.9300314",

language = "English",

editor = "Pietralunga, {Silvia Maria} and Stefano Selleri",

booktitle = "Proceedings of 2020 Italian Conference on Optics and Photonics, ICOP 2020",

publisher = "Institute of Electrical and Electronics Engineers",

address = "United States",

}

Kaplan, AE, van der Tol, JJGM, Bassi, P & Bellanca, G 2020, Analysis of Etch Depth for Polarization-free Directional Couplers. in SM Pietralunga & S Selleri (eds), Proceedings of 2020 Italian Conference on Optics and Photonics, ICOP 2020., 9300314, Institute of Electrical and Electronics Engineers, 2020 Italian Conference on Optics and Photonics, ICOP 2020, Parma, Italy, 8/09/20. https://doi.org/10.1109/ICOP49690.2020.9300314

Analysis of Etch Depth for Polarization-free Directional Couplers. / Kaplan, Ali Emre; van der Tol, Jos J.G.M.; Bassi, Paolo et al.
Proceedings of 2020 Italian Conference on Optics and Photonics, ICOP 2020. ed. / Silvia Maria Pietralunga; Stefano Selleri. Institute of Electrical and Electronics Engineers, 2020. 9300314.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Analysis of Etch Depth for Polarization-free Directional Couplers

AU - Kaplan, Ali Emre

AU - van der Tol, Jos J.G.M.

AU - Bassi, Paolo

AU - Bellanca, Gaetano

PY - 2020/12/25

Y1 - 2020/12/25

N2 - We numerically analyze the etch depth as a design parameter for the realization of integrated polarization independent directional couplers. Through finite-element-method simulations, the coupling coefficients of transverse-electric (TE) and transverse-magnetic (TM) polarizations are investigated according to different etch depth levels in the coupling section of the studied device. By optimizing etching depth, the proposed coupler can perform similarly for both polarizations in broadband. According to simulation results, the minimum difference between the TE and TM coupling coefficients can be kept less than 1% in 100 nm of the wavelength range.

AB - We numerically analyze the etch depth as a design parameter for the realization of integrated polarization independent directional couplers. Through finite-element-method simulations, the coupling coefficients of transverse-electric (TE) and transverse-magnetic (TM) polarizations are investigated according to different etch depth levels in the coupling section of the studied device. By optimizing etching depth, the proposed coupler can perform similarly for both polarizations in broadband. According to simulation results, the minimum difference between the TE and TM coupling coefficients can be kept less than 1% in 100 nm of the wavelength range.

KW - directional couplers

KW - photonic integrated circuits

KW - polarization-independent circuits

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U2 - 10.1109/ICOP49690.2020.9300314

DO - 10.1109/ICOP49690.2020.9300314

M3 - Conference contribution

AN - SCOPUS:85099586742

BT - Proceedings of 2020 Italian Conference on Optics and Photonics, ICOP 2020

A2 - Pietralunga, Silvia Maria

A2 - Selleri, Stefano

PB - Institute of Electrical and Electronics Engineers

T2 - 2020 Italian Conference on Optics and Photonics, ICOP 2020

Y2 - 8 September 2020 through 11 September 2020

ER -

Analysis of Etch Depth for Polarization-free Directional Couplers

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Keywords

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