Analysis of Etch Depth for Polarization-free Directional Couplers

Ali Emre Kaplan, Jos J.G.M. van der Tol, Paolo Bassi, Gaetano Bellanca

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Abstract

We numerically analyze the etch depth as a design parameter for the realization of integrated polarization independent directional couplers. Through finite-element-method simulations, the coupling coefficients of transverse-electric (TE) and transverse-magnetic (TM) polarizations are investigated according to different etch depth levels in the coupling section of the studied device. By optimizing etching depth, the proposed coupler can perform similarly for both polarizations in broadband. According to simulation results, the minimum difference between the TE and TM coupling coefficients can be kept less than 1% in 100 nm of the wavelength range.

Original languageEnglish
Title of host publicationProceedings of 2020 Italian Conference on Optics and Photonics, ICOP 2020
EditorsSilvia Maria Pietralunga, Stefano Selleri
PublisherInstitute of Electrical and Electronics Engineers
Number of pages4
ISBN (Electronic)9781728162393
DOIs
Publication statusPublished - 25 Dec 2020
Event2020 Italian Conference on Optics and Photonics, ICOP 2020 - Parma, Italy
Duration: 8 Sep 202011 Sep 2020

Conference

Conference2020 Italian Conference on Optics and Photonics, ICOP 2020
CountryItaly
CityParma
Period8/09/2011/09/20

Bibliographical note

Publisher Copyright:
© 2020 IEEE.

Copyright:
Copyright 2021 Elsevier B.V., All rights reserved.

Keywords

  • directional couplers
  • photonic integrated circuits
  • polarization-independent circuits

Fingerprint Dive into the research topics of 'Analysis of Etch Depth for Polarization-free Directional Couplers'. Together they form a unique fingerprint.

Cite this