Analysis and optimization of the lithography area of MOS4YOU

H.J.A. Rulkens, Technische Universiteit Eindhoven (TUE). Stan Ackermans Instituut. Computergesteund ontwerpen en fabriceren van discrete produkten

    Research output: ThesisEngD Thesis

    Original languageEnglish
    QualificationDoctor of Philosophy
    Awarding Institution
    • Rooda, Koos, Supervisor
    • Gemmink, J.W., External supervisor, External person
    • van Campen, E.J.J., Supervisor
    Award date1 Jan 1996
    Place of PublicationEindhoven
    Print ISBNs90-5282-735-4
    Publication statusPublished - 1996

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