Analysis and optimization of the lithography area of MOS4YOU

H.J.A. Rulkens; Technische Universiteit Eindhoven (TUE). Stan Ackermans Instituut. Computergesteund ontwerpen en fabriceren van discrete produkten

Analysis and optimization of the lithography area of MOS4YOU

H.J.A. Rulkens, Technische Universiteit Eindhoven (TUE). Stan Ackermans Instituut. Computergesteund ontwerpen en fabriceren van discrete produkten

Research output: Thesis › EngD Thesis

Original language	English
Qualification	Doctor of Philosophy
Awarding Institution
Supervisors/Advisors	Rooda, Koos, Supervisor Gemmink, J.W., External supervisor, External person van Campen, E.J.J., Supervisor
Award date	1 Jan 1996
Place of Publication	Eindhoven
Publisher	Technische Universiteit Eindhoven. Stan Ackermans Instituut
Print ISBNs	90-5282-735-4
Publication status	Published - 1996

Bibliographical note

Eindverslag

Cite this

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title = "Analysis and optimization of the lithography area of MOS4YOU",

author = "H.J.A. Rulkens and {Technische Universiteit Eindhoven (TUE). Stan Ackermans Instituut. Computergesteund ontwerpen en fabriceren van discrete produkten}",

note = "Eindverslag",

year = "1996",

language = "English",

isbn = "90-5282-735-4",

publisher = "Technische Universiteit Eindhoven. Stan Ackermans Instituut",

type = "EngD Thesis",

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AU - Rulkens, H.J.A.

AU - Technische Universiteit Eindhoven (TUE). Stan Ackermans Instituut. Computergesteund ontwerpen en fabriceren van discrete produkten

N1 - Eindverslag

PY - 1996

Y1 - 1996

M3 - EngD Thesis

SN - 90-5282-735-4

PB - Technische Universiteit Eindhoven. Stan Ackermans Instituut

CY - Eindhoven

ER -