An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications

R. Groenen, J.L. Linden, H.R.M. Lierop, van, D.C. Schram, A.D. Kuypers, M.C.M. Sanden, van de

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

A new method for low temperature deposition of surface textured ZnO:Al is presented utilizing an expanding thermal plasma created by a cascaded arc. Films are deposited at 200 degrees C at the rate of 0.65-0.75 nm s/sup -1/ exhibiting low resistivity (10/sup -3/ ncm), high visible transmittance (>80%) and a rough surface texture. First application in p-i-n a-Si:H solar cells indicates promising light trapping properties
Original languageEnglish
Pages (from-to)40-43
Number of pages4
JournalApplied Surface Science
Volume173
Issue number1-2
DOIs
Publication statusPublished - 2001

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