Abstract
An efficient method of simulating process and geometry dependence of compact model parameters for circuit simulation is presented. It facilitates efficient bipolar process and device optimization with respect to circuit performance. The results of this scaling method are in good agreement with measurements.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of IEEE International Electron Devices Meeting |
| Publisher | Institute of Electrical and Electronics Engineers |
| Pages | 105-108 |
| Number of pages | 4 |
| ISBN (Print) | 0780314506 |
| DOIs | |
| Publication status | Published - 6 Aug 2002 |
| Externally published | Yes |
| Event | 1993 IEEE International Electron Devices Meeting, IEDM 1993 - Washington, United States Duration: 5 Dec 1993 → 8 Dec 1993 |
Conference
| Conference | 1993 IEEE International Electron Devices Meeting, IEDM 1993 |
|---|---|
| Country/Territory | United States |
| City | Washington |
| Period | 5/12/93 → 8/12/93 |
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