An analysis of the falling film gas-liquid reactor

E.J. Davis, M.P. Ouwerkerk-Dijkers, van, S. Venkatesh

Research output: Contribution to journalArticleAcademicpeer-review

25 Citations (Scopus)

Abstract

A mathematical model of the falling film reactor is developed to predict the conversion and temperature distribution in the reactor as a function of the gas and liquid flow rates, physical properties, the feed composition of the reactive gas and carrier gas and other parameters of the system. Transverse and axial temperature profiles are calculated for the laminar flow of the liquid phase with concurrent flow of a turbulent gas to establish the peak temperatures in the reactor as a function of the numerous parameters of the system. The reaction rate in the liquid film is considered to be controlled by the rate of transport of reactive gas from the turbulent gas mixture to the gas-liquid interface. The governing equations are solved by reformulating the problem in integral equation form employing Green's functions. The predicted reactor characteristics are shown to agree with large-scale reactor performance, and the effects of the most sensitive parameters are elucidated to provide a basis for reactor optimization. Numerical results are presented for realistic sulfonation reactor conditions.
Original languageEnglish
Pages (from-to)539-550
Number of pages12
JournalChemical Engineering Science
Volume34
Issue number4
DOIs
Publication statusPublished - 1979

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