Amorphous hydrogenated carbon films deposited with an expanding thermal plasma

J.W.A.M. Gielen, P.R.M. Kleuskens, M.J. Zande, van der, A.G.M. Kiers, M.C.M. Sanden, van de, D.C. Schram

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With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amorphous hydrogenated carbon films have been deposited on glass and silicon substrates. The plasma burns on argon to which acetylene is added as precursor gas. The plasma parameters varied are the flow of acetylene and the elec. current through the plasma. The films have been analyzed ex-situ. Fourier Transform IR Spectroscopy reveals the bonding types, the thickness and refractive index of the films and from Nano-indentation expts. the hardness of the films is obtained. It is found that with decreasing arc current and increasing acetylene flow, the hardness, refractive index and growth rate of the films increase. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)226-229
JournalVide: Science, Technique et Applications
Issue numberSuppl.2
Publication statusPublished - 1995


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