TY - JOUR
T1 - Amorphous hydrogenated carbon films deposited with an expanding thermal plasma
AU - Gielen, J.W.A.M.
AU - Kleuskens, P.R.M.
AU - Zande, van der, M.J.
AU - Kiers, A.G.M.
AU - Sanden, van de, M.C.M.
AU - Schram, D.C.
PY - 1995
Y1 - 1995
N2 - With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amorphous hydrogenated carbon films have been deposited on glass and silicon substrates. The plasma burns on argon to which acetylene is added as precursor gas. The plasma parameters varied are the flow of acetylene and the elec. current through the plasma. The films have been analyzed ex-situ. Fourier Transform IR Spectroscopy reveals the bonding types, the thickness and refractive index of the films and from Nano-indentation expts. the hardness of the films is obtained. It is found that with decreasing arc current and increasing acetylene flow, the hardness, refractive index and growth rate of the films increase. [on SciFinder (R)]
AB - With a recently constructed deposition set-up, based on the expanding thermal plasma technique, amorphous hydrogenated carbon films have been deposited on glass and silicon substrates. The plasma burns on argon to which acetylene is added as precursor gas. The plasma parameters varied are the flow of acetylene and the elec. current through the plasma. The films have been analyzed ex-situ. Fourier Transform IR Spectroscopy reveals the bonding types, the thickness and refractive index of the films and from Nano-indentation expts. the hardness of the films is obtained. It is found that with decreasing arc current and increasing acetylene flow, the hardness, refractive index and growth rate of the films increase. [on SciFinder (R)]
M3 - Article
SN - 1266-0167
VL - 275
SP - 226
EP - 229
JO - Vide: Science, Technique et Applications
JF - Vide: Science, Technique et Applications
IS - Suppl.2
ER -