Amorphous and microcrystalline silicon solar cells

R.E.I. Schropp

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

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Abstract

Thin-film silicon exists in different phases, ranging from amorphous via microcrystalline to single crystalline. In contrast to the periodic lattice that characterises the crystalline form, there is only very short-range order in amorphous silicon (a-Si:H). The first amorphous silicon layers were deposited in an rf-driven glow discharge using silane. This deposition technique is now usually called plasma-enhanced chemical vapour deposition (PECVD). The hot-wire CVD (HWCVD) technique is based on the decomposition of silicon-containing gases at a catalytic hot surface. Today many groups study HWCVD thin-film silicon and its alloys for various applications such as solar cells, passivation layers, and thin-film transistors. This chapter discusses the basic operation of a basic thin-film silicon solar cell and then presents the thin-film structure and technology. It also talks about the status of the technology of single-junction cells in the laboratory.
Original languageEnglish
Title of host publicationSolar cell materials : developing technologies
EditorsG.J. Conibeer, A. Willoughby
Place of PublicationChichester
PublisherWiley
Pages87-114
Number of pages342
ISBN (Print)978-0-470-06551-8
Publication statusPublished - 2014

Publication series

NameWiley Series in Materials for Electronic & Optoelectronic Applications

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