AML: a visual programming language for ASM lithography

T.F. Albu, Technische Universiteit Eindhoven (TUE). Stan Ackermans Instituut. Master of Technological Design (MTD)

    Research output: ThesisPd Eng Thesis

    Original languageEnglish
    QualificationDoctor of Philosophy
    Awarding Institution
    • Bloo, Roel, Supervisor
    • van Lierop, H.P.J., External supervisor
    • Kruijswijk, L.B., External supervisor, External person
    Award date1 Jan 2003
    Place of PublicationEindhoven
    Print ISBNs90-444-0260-9
    Publication statusPublished - 2003

    Bibliographical note

    Eindverslag, confidential

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