ALD for 3D-integrated batteries : TiN AS Li-diffusion barrier

H.C.M. Knoops, M.E. Donders, L. Baggetto, M.C.M. Sanden, van de, R.A.H. Niessen, P.H.L. Notten, W.M.M. Kessels

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Downloads (Pure)
Original languageEnglish
Title of host publicationProceedings of the 8th International Conference on Atomic Layer Deposition (ALD 2008), June 29 - July 2008, Bruges, Belgium (Book of Abstracts)
EditorsW.M.M. Kessels, A. Delabie
Place of PublicationS.n.
Publishers.n.
PagesWedA2b-4-
Publication statusPublished - 2008

Cite this