ALD – a truly enabling nanotechnology: And how the Netherlands contributed to its wide spread application

Research output: Contribution to journalArticlePopular

Abstract

Atomic layer deposition (ALD) is a method to precisely deposit high-quality
nanolayers of all kind of materials. As such, it is a true nanotechnology which – among a multitude of other applications – enables the fabrication of the integrated circuits in your smart phone.
In this introductory article, the method of ALD and its merits are briefly introduced. Also its history is presented in a nutshell and it is discussed how our country has played a vital role in the research and development of ALD and its widespread use now and in the future.
Original languageEnglish
Article number2
Pages (from-to)6-9
JournalNevac Blad
Volume58
Issue numberspecial
Publication statusPublished - 2 Jun 2020

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