Advanced spectroscopic study of the densities and kinetics of SiHx radicals during high-rate plasma deposition of a-Si:H

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Original languageEnglish
Title of host publicationMRS Spring meeting 2001, April 16-20, San Francisco, abstracts
Pages12
Publication statusPublished - 2001

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