Advanced spectroscopic study of the densities and kinetics of SiHx radicals during high-rate plasma deposition of a-Si:H

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

Original language	English
Title of host publication	MRS Spring meeting 2001, April 16-20, San Francisco, abstracts
Pages	12
Publication status	Published - 2001

Cite this

@inproceedings{0a8bf2f17e24453e864ec1427842f414,

title = "Advanced spectroscopic study of the densities and kinetics of SiHx radicals during high-rate plasma deposition of a-Si:H",

author = "J.P.M. Hoefnagels and W.M.M. Kessels and A.A.E. Stevens and D.C. Schram and {Sanden, van de}, M.C.M.",

year = "2001",

language = "English",

pages = "12",

booktitle = "MRS Spring meeting 2001, April 16-20, San Francisco, abstracts",

}

TY - GEN

T1 - Advanced spectroscopic study of the densities and kinetics of SiHx radicals during high-rate plasma deposition of a-Si:H

AU - Hoefnagels, J.P.M.

AU - Kessels, W.M.M.

AU - Stevens, A.A.E.

AU - Schram, D.C.

AU - Sanden, van de, M.C.M.

PY - 2001

Y1 - 2001

M3 - Conference contribution

SP - 12

BT - MRS Spring meeting 2001, April 16-20, San Francisco, abstracts

ER -