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Advanced gate stack, source/drain and channel engineering for Si-based CMOS 4 : new materials, processes and equipment
P.J. Timans (Editor), E.P. Gusev (Editor), H. Iwai (Editor), D.-L. Kwong (Editor), M. Öztürk (Editor), F. Roozeboom (Editor)
Research output: Book/Report › Book editing › Academic