Advanced gate stack, source/drain and channel engineering for Si-based CMOS 5 : new materials, processes and equipment

V. Narayan (Editor), F. Roozeboom (Editor), D.-L. Kwong (Editor), H. Iwai (Editor), E.P. Gusev (Editor), P.J. Timans (Editor)

Research output: Book/ReportBook editingAcademicpeer-review

Abstract

Proceedings of the 215th ECS Meeting, May 24 - May 29, 2009, San Francisco, CA
Original languageEnglish
Place of PublicationPennington (NJ)
PublisherElectrochemical Society, Inc.
ISBN (Print)978-1-56677-709-4
Publication statusPublished - 2009

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