Active and passive spectroscopy in plasma deposition and plasma etching

D.C. Schram

Active and passive spectroscopy in plasma deposition and plasma etching

Plasma & Materials Processing

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Original language	English
Title of host publication	Comptes rendus des travaux du 8e colloque international sur les procedes plama, 10-14 juin, 1991, Antibes, Juan-les-Pins, France
Place of Publication	Paris
Publisher	Société Française du Vide
Pages	1-8
Publication status	Published - 1991

Publication series

Name	Le vide, les couches minces
Volume	suppl. 256

Access to Document

607429Final published version, 941 KB

Cite this

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title = "Active and passive spectroscopy in plasma deposition and plasma etching",

author = "D.C. Schram",

year = "1991",

language = "English",

series = "Le vide, les couches minces",

publisher = "Soci{\'e}t{\'e} Fran{\c c}aise du Vide",

pages = "1--8",

booktitle = "Comptes rendus des travaux du 8e colloque international sur les procedes plama, 10-14 juin, 1991, Antibes, Juan-les-Pins, France",

}

Active and passive spectroscopy in plasma deposition and plasma etching. / Schram, D.C.

Comptes rendus des travaux du 8e colloque international sur les procedes plama, 10-14 juin, 1991, Antibes, Juan-les-Pins, France. Paris : Société Française du Vide, 1991. p. 1-8 (Le vide, les couches minces; Vol. suppl. 256).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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BT - Comptes rendus des travaux du 8e colloque international sur les procedes plama, 10-14 juin, 1991, Antibes, Juan-les-Pins, France

PB - Société Française du Vide

CY - Paris

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