Abstract
Plasma processing, such as plasma deposition and etching, requires accurate control of the plasma ion energy. It can be realized by biasing the reactor table with a tailored voltage waveform. Switched-mode power converters can be used to generate the tailored waveforms. Since the plasma reactor is capacitive, it forms an LC circuit with the stray inductance in the loop, which could cause severe resonances to the output waveform. In order to accurately control the ion energy, a smooth tailored voltage waveform is required. In this research, a trajectory control method is introduced based on the equivalent electric circuit model of the plasma reactor. The control method is able to deliver a well-defined output waveform by controlling the switching sequence properly, rather than using passive and dissipative resistive damping.
| Original language | English |
|---|---|
| Title of host publication | 2022 International Power Electronics Conference, IPEC-Himeji 2022-ECCE Asia |
| Publisher | Institute of Electrical and Electronics Engineers |
| Pages | 498-505 |
| Number of pages | 8 |
| ISBN (Electronic) | 978-4-8868-6425-3 |
| DOIs | |
| Publication status | Published - 1 Jul 2022 |
| Event | 2022 International Power Electronics Conference, IPEC- ECCE Asia 2022 - Himeji, Japan Duration: 15 May 2022 → 19 May 2022 |
Conference
| Conference | 2022 International Power Electronics Conference, IPEC- ECCE Asia 2022 |
|---|---|
| Country/Territory | Japan |
| City | Himeji |
| Period | 15/05/22 → 19/05/22 |
Bibliographical note
Funding Information:The authors gratefully acknowledge the financial support of Prodrive Technologies B.V. and the help and profound comments from Prof. Wilhelmus M.M. (Erwin) Kessels, Dr. Adriaan J.M. Mackus, Javier Escandon-Lopez, Erik Heijdra, Anton Driessen, Dr. Tahsin Faraz, Koen Buskes, Pedro Dans, Yuri Verstappen, and Dr. Shashank Balasubramanyam.
Keywords
- Ion energy control
- plasma deposition and etching
- switched-mode power converter
- trajectory control
