Abstract
The accuracy with which film parameters can be determined from ellipsometric measurement data obtained at a limited number of incidence angles is analysed. The analysis is restricted to low loss films on transparent or slightly absorbing substrates. Further, a method is described for estimating the magnitude of random and systematic measurement errors. Results are experimentally verified for thermally grown oxide films on silicon substrates
| Original language | English |
|---|---|
| Pages (from-to) | 193-203 |
| Journal | Thin Solid Films |
| Volume | 189 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 1990 |
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