@inproceedings{1403e2cbd0924f0b9bf58110b5b11371,
title = "Aberration retrieval for high-NA optical systems using the Extended Nijboer-Zernike theory",
abstract = "Previously, we have given a detailed description of the so-called Extended Nijboer-Zernike approach and its application to aberration measurements of the optical projection system in a wafer scanner in the case of a low or medium high-NA system. The Extended Nijboer-Zernike theory provides an analytical description of the through-focus intensity point-spread function in the presence of lens aberrations and defocus. Taking the Extended Nijboer-Zernike description for the electric field components in the case of a high-NA optical system as a starting point, we present an approach to aberration retrieval when the NA is very high. The experimental procedure involves the analysis of a focus-exposure matrix. The differences between aberration retrieval using the low-NA scalar model and the high-NA full vectorial model are discussed. The mathematical framework is shown and the experimental procedure to extract aberrations for a high-NA lens is demonstrated on modern 193 nm wafer scanners.",
author = "P. Dirksen and J.J.M. Braat and A.J.E.M. Janssen and A. Leeuwestein",
year = "2005",
doi = "10.1117/12.597406",
language = "English",
series = "Proceedings of SPIE",
publisher = "SPIE",
pages = "262--273",
booktitle = "Proceedings Optical Microlithography XVIII, 1 - 4 March 2005, San Jose, California",
address = "United States",
}