A systematic database of thin-film measurements by EPMA Part II: Palladium films

G.F. Bastin, H.J.M. Heijligers

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Abstract

In succession to the authors' work on Al films a systematic database of thin-film measurements on Pd films by electron probe microanal. is presented. This time the measurements were performed at accelerating voltages between 4 and 30 kV, again on films of six different nominal thicknesses, ranging from 100 to 3200 .ANG., which were deposited simultaneously on 20 different substrates, ranging between Be and Bi. The purpose of this work was to provide further systematic data on which thin-film programs can be tested. A total of 931 k ratios for the film element Pd and 913 k ratios for the various substrate elements were collected. Tests with the authors' most recent thin-film program, TFA, based on the double Gaussian PROZA96 procedure, on this database showed even better performance than in the previous case for the Al films: a mean value of 0.996 for kcalc/kmeas and a relative root-mean-square deviation of 3.266% in the histogram for the film element. [on SciFinder (R)]
Original languageEnglish
Pages (from-to)373-397
JournalX-Ray Spectrometry
Volume29
Issue number5
DOIs
Publication statusPublished - 2000

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