A single etch-step fabrication-tolerant polarization splitter

L.M. Augustin; J.J.G.M. Tol, van der; R. Hanfoug; W.J.M. Laat, de; M.J.E. Moosdijk, van de; P.W.L. Dijk, van; Y.S. Oei; M.K. Smit

doi:10.1109/JLT.2006.890430

A single etch-step fabrication-tolerant polarization splitter

L.M. Augustin, J.J.G.M. Tol, van der, R. Hanfoug, W.J.M. Laat, de, M.J.E. Moosdijk, van de, P.W.L. Dijk, van, Y.S. Oei, M.K. Smit

Photonic Integration

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Abstract

A tolerant single etch-step passive polarization splitter on InP/InGaAsP is designed and fabricated. The device consists of a directional coupler with a wide and a narrow waveguide. Modal birefringence of the third-order modes for transverse electric (TE) and transverse magnetic (TM) polarizations is employed to selectively couple one polarization. Tapering is applied to increase the tolerances. The devices are characterized, and the measurement results show good agreement with the beam-propagation-method simulations: a splitting ratio larger than 95% for a width range of around 100 nm and over a large wavelength range, covering at least the C-band

Original language	English
Pages (from-to)	740-746
Number of pages	7
Journal	Journal of Lightwave Technology
Volume	25
Issue number	3
DOIs	https://doi.org/10.1109/JLT.2006.890430
Publication status	Published - 2007

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title = "A single etch-step fabrication-tolerant polarization splitter",

abstract = "A tolerant single etch-step passive polarization splitter on InP/InGaAsP is designed and fabricated. The device consists of a directional coupler with a wide and a narrow waveguide. Modal birefringence of the third-order modes for transverse electric (TE) and transverse magnetic (TM) polarizations is employed to selectively couple one polarization. Tapering is applied to increase the tolerances. The devices are characterized, and the measurement results show good agreement with the beam-propagation-method simulations: a splitting ratio larger than 95% for a width range of around 100 nm and over a large wavelength range, covering at least the C-band",

author = "L.M. Augustin and {Tol, van der}, J.J.G.M. and R. Hanfoug and {Laat, de}, W.J.M. and {Moosdijk, van de}, M.J.E. and {Dijk, van}, P.W.L. and Y.S. Oei and M.K. Smit",

year = "2007",

doi = "10.1109/JLT.2006.890430",

language = "English",

volume = "25",

pages = "740--746",

journal = "Journal of Lightwave Technology",

issn = "0733-8724",

publisher = "Institute of Electrical and Electronics Engineers",

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TY - JOUR

T1 - A single etch-step fabrication-tolerant polarization splitter

AU - Augustin, L.M.

AU - Tol, van der, J.J.G.M.

AU - Hanfoug, R.

AU - Laat, de, W.J.M.

AU - Moosdijk, van de, M.J.E.

AU - Dijk, van, P.W.L.

AU - Oei, Y.S.

AU - Smit, M.K.

PY - 2007

Y1 - 2007

N2 - A tolerant single etch-step passive polarization splitter on InP/InGaAsP is designed and fabricated. The device consists of a directional coupler with a wide and a narrow waveguide. Modal birefringence of the third-order modes for transverse electric (TE) and transverse magnetic (TM) polarizations is employed to selectively couple one polarization. Tapering is applied to increase the tolerances. The devices are characterized, and the measurement results show good agreement with the beam-propagation-method simulations: a splitting ratio larger than 95% for a width range of around 100 nm and over a large wavelength range, covering at least the C-band

AB - A tolerant single etch-step passive polarization splitter on InP/InGaAsP is designed and fabricated. The device consists of a directional coupler with a wide and a narrow waveguide. Modal birefringence of the third-order modes for transverse electric (TE) and transverse magnetic (TM) polarizations is employed to selectively couple one polarization. Tapering is applied to increase the tolerances. The devices are characterized, and the measurement results show good agreement with the beam-propagation-method simulations: a splitting ratio larger than 95% for a width range of around 100 nm and over a large wavelength range, covering at least the C-band

U2 - 10.1109/JLT.2006.890430

DO - 10.1109/JLT.2006.890430

M3 - Article

SN - 0733-8724

VL - 25

SP - 740

EP - 746

JO - Journal of Lightwave Technology

JF - Journal of Lightwave Technology

IS - 3

ER -

A single etch-step fabrication-tolerant polarization splitter

Abstract

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